Chipmaker TSMC is expected to receive the first shipment of High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) ...

Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography.

Oregon and Intel were passed over for an $825M chip research center award, but officials say the state remains a strong ...

U.S. Senate Majority Leader Charles Schumer said that NY CREATES, the nonprofit entity that owns and operates cutting-edge ...

In October 2019, SK Hynix developed 1Znm 16GB (Gigabits) DDR4 (Double Data Rate 4) DRAM. As 16 GB is the industry’s largest ...

However, the size of the features it can create is limited by the wavelength of the light used, leading to the development of techniques such as electron beam lithography and extreme ultraviolet ...

New York will be the home to the first semiconductor technology center in the country. “It’s a landmark day for the Captial ...

This is achieved by building 3D structures into the template design. With optical lithography and extreme-ultraviolet lithography, multiple templates and multiple patterning steps are needed to ...

Corning ® EXTREME ULE ® Glass will help semiconductor industry leaders mass-produce leading-edge chips vital to advanced artificial intelligence technologies. Corning designed EXTREME ULE ...

With the introduction of Extreme Ultra Violet lithography, the need for EUV test facilities increased, so it was time for a second generation. With EBL2, research assignments can be done 100 times ...

Acquired by Intel in 2015, IMS Nanofabrication is a Vienna, Austria-based business that develops multi-beam masking tools that are required to develop advanced extreme ultraviolet lithography ...

Taiwan Semiconductor Manufacturing, Intel, and Samsung’s fabs were redesigned one decade ago to make them suitable for extreme ultraviolet lithography, or EUV, a costly and long endeavor ...